摘要
Nitrogenated carbon films were prepared on silicon substrates by cathodic electrodepositon from solutions of dicyandiamide (C2H4N4) in ethanol. The composition and structure of the films were characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy and Raman spectroscopy. The results show that the incorporated nitrogen in the films is chemically bonded to carbon with C-N, C=N and C≡N bonds, and the concentration of the depositing solutions has a great effect on the films deposition. The films have good chemical inertness and mechanical properties. A hardness of 1200 HV has been measured.
源语言 | 英语 |
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页(从-至) | 166-170 |
页数 | 5 |
期刊 | Materials Letters |
卷 | 42 |
期 | 3 |
DOI | |
出版状态 | 已出版 - 2000 |