A Basic Psychophysics Study of Visual Masking Effect on Kanji Recognition for Image Recognition Technology

Qi Dai, Lichang Yao, Ikue Hattori, Qiong Wu, Jiajia Yang, Satoshi Takahashi, Yoshimichi Ejima, Jinglong Wu

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

The masking paradigm is the most used method for generating subliminal stimuli. When both the target stimulus and the mask stimulus are composed of spatial pattern, the mask reduces the visibility of the target. It was called pattern masking effect. Japanese kanji as special visual semantic information, especially when kanji as a subliminal visual stimulus, it is not clear whether Kanji is regulated by the pattern masking effect. Therefore, in this study, we measured the sensitivity index of Kanji detection or discrimination in the masking paradigm using the calculation method of SDT (Signal Detection Theory). By this way, present study investigated the intensity of the masking effect. Results suggested that the sensitivity index of Kanji have the significant difference between the different target presentation time both of detection and discrimination task. As the presentation time is longer, the sensitivity index increases. Results also showed that there is a difference in the cognitive process between detection and discrimination of stimuli, and even if the stimuli can be detected, they may not be discriminated. In addition, as the intensity of the stimulus increased, the intensity of the masking effect became weaker, and it was found that the pattern mask also produces a masking effect in the detection and discrimination of Kanji. According to the research on human visual processing characteristics, it is hoped to help improve the efficiency of computer vision recognition technology.

源语言英语
主期刊名2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021
出版商Institute of Electrical and Electronics Engineers Inc.
1292-1297
页数6
ISBN(电子版)9781665441001
DOI
出版状态已出版 - 8 8月 2021
已对外发布
活动18th IEEE International Conference on Mechatronics and Automation, ICMA 2021 - Takamatsu, 日本
期限: 8 8月 202111 8月 2021

出版系列

姓名2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021

会议

会议18th IEEE International Conference on Mechatronics and Automation, ICMA 2021
国家/地区日本
Takamatsu
时期8/08/2111/08/21

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