Abstract
This paper presents a single-crystal silicon (SCS)-based, integrated 3-axis accelerometer fabricated using a post-CMOS micromachining process. This new CMOS-MEMS process provides monolithic integration of electronics and SCS rnicrostructures, and electrical isolation of silicon. By employing a unique vertical sensing mechanism, 3-axis acceleration sensing is achieved with a single proof mass. The symmetric structures and fully differential configuration of all the sensing electrodes can greatly reduce the cross couplings among the 3 axes. By sacrificing one interconnect metal layer, the silicon undercut of the sensing comb fingers is minimized, resulting in much higher sensitivity with the same device footprint. A wet Al etching process was also developed to remove the top Al layer without attacking the Al layers exposed from the sidewalls of the multilayer Al/oxide stacks. A two-stage, open-loop, continuous time chopper stabilized amplifier is integrated on the chip.
Original language | English |
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Pages | 661-664 |
Number of pages | 4 |
Publication status | Published - 2004 |
Externally published | Yes |
Event | IEEE Sensors 2004 - Vienna, Austria Duration: 24 Oct 2004 → 27 Oct 2004 |
Conference
Conference | IEEE Sensors 2004 |
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Country/Territory | Austria |
City | Vienna |
Period | 24/10/04 → 27/10/04 |
Keywords
- 3-Axis accelerometer
- Aluminum etching
- CMOS-MEMS
- Integrated accelerometer